The revolutionary XERADEX® xenon excimer lamp system from OSRAM opens up entirely new possibilities in process technology. Our patented pulsed mode of operation yields four times the radiation power of conventional excimer radiators: 40 percent of the input energy is converted into useable vacuum ultraviolet (VUV) radiation.
Their high efficiency makes these systems ideal for very effective, flexible use in many demanding applications, such as surface treatment, ozone production, laquer frosting, water purification, and many more. The quartz bulb functions as a dielectric barrier within a unique electrode system, which prevents the formation of an electric arc during the discharge phase. If xenon is the fill gas – as in the XERADEX® lamps – and if a special pulsed voltage is applied across the electrodes, unstable xenon excimer molecules (Xe2*) are formed from the xenon atoms. These molecules dissociate by emitting VUV radiation at 172 nm.
The XERADEX® lamps emit incoherent VUV radiation. The exceptional efficiency of these systems means no cooling of the lamp is required, as the temperature of the radiator never exceeds 80°C (175°F). This flexibility facilitates the integration of XERADEX® systems into even the most sophisticated processes and advanced production equipment.
The unique operating principle leads to unbeatable efficiency – with no cooling required The XERADEX® system has an outstanding 40 percent conversion efficiency (electrical to UV) compared to 10 percent in conventional sinusoidally driven systems. This tremendous advantage is due to our patented pulsed operation mode and to the innovative lamp design of XERADEX®. When operated using the companion electronic control gear (ECG), the result is a compact system of remarkable performance.
Versatile applications
XERADEX® unleashes the imagination and opens the doors for new concepts in process technology. Its impressive efficiency and simplicity makes this system ideal for highly cost-effective solutions in the most demanding applications, particularly in surface cleaning and modification, the production of ozone, water purification and numerous other applications.
Fast, thorough and precise
UV/ozone cleaning for semiconductor and FPD production Due to more complex surface structures and increasing packaging densities of electronics, demand for new cleaning methods is increasing in both semiconductor and flat panel display (FPD) industries.
The XERADEX® systems open new possibilities for innovative dry cleaning processes. At 166 kcal/mol (7.2 eV), the high photon energy of the radiation breaks even tenacious molecular bonds quickly and efficiently. The concurrent production of ozone and oxygen radicals accelerates cleaning and thus reduces process time considerably. In particular, oxygen radicals O(1D), which are the major contributor to surface cleaning effects, are formed in large quantities by the XERADEX® technology. The UV/ozone cleaning mechanism enables processes like the removal of organics (e.g., photoresist from wafers and photo masks) and the activation of surfaces in semiconductor applications, often minimizing or eliminating the use of harsh chemical treatment steps.
In liquid crystal display and plasma display panel manufacturing, the wettability of the mother glass must be increased for subsequent wet cleaning, coating and etching. Irradiation with XERADEX® improves the wettability of glass substrates considerably and 20 times faster than low-pressure Intensity [a.u] mercury lamps.
Surface activation and modification
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Removal of polymers:
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Removal of organic residue
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Cleaning of photo masks
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Improved coating properties of photosensitive resist
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Improved yield of deposition
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Resist removal
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Etching (e.g., Teflon)
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Surface treatment:
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Activation of surface bonds
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Adjustment of wetting angle
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Higher coating yield
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Better bonding performance
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Faster and better vacuum in process chambers
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No external ozonator required for the UV/ozone cleaning process
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Photo induced metallization at room temperature on various surfaces, e.g., plastics
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Photo induced CVD at lower process temperatures (high k-deposition, high growth rate, low temperature)
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Laquer frosting: microfolding of
radiation curable coatings to generate dull surfaces
Ozone production
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Direct dissociation of oxygen by the high energetic XERADEX® radiation and formation of ozone: no byproducts, such as NOx are produced
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Highly efficient ozone production with the XERADEX® lamps. Ozone yield: 82 g/kWh
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No cooling required
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In-situ production of ozone Water cleaning and ultra-pure water preparation
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Efficient production of reactive
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Complete mineralization of organic components
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Preparation of ultra-pure water
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Evaluation of fluorescent substances
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Photochemical experiments
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Evaluation of fluorescent substances
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Photochemical experiments
Unique advantages
The compact XERADEX® systems offer a multitude of advantages to the user:
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For the first time, a highly efficient VUV radiation source is available for different demanding industrial applications.
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Its 40 percent efficiency eliminates the need for cooling of the lamp – the temperature of the radiator never exceeds 80°C (176°F) "cold radiation"; low temperature processing is possible.
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The system of lamp and electronic control gear is compact and easy to handle.
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Convenient, compact irradiation systems are possible, minimizing space in costly cleanroom environments.
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Lamp starts instantly with no warm-up phase; the ignition is independent of the ambient temperature; no shutters are necessary.
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No limitations on switching cycles; capable of instant restrike with no detriment to lamp life.
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PLC control output.
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Operation of the lamp in different environments is possible, such as in gaseous media and under vacuum conditions.
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The lamp is environmentally friendly; it contains inert gases exclusively with no mercury used.
Fit for the future: OSRAM XERADEX® excimer systems
A Profitable Investment
The use of the superior OSRAM Xeradex systems in place of conventional surface treatment methods is highly worthwile in spite of higher inital costs.
The use of the superior OSRAM Xeradex systems in place of conventional surface treatment methods is highly worthwile in spite of higher inital costs.
More information:
The revolution in excimer radiation: OSRAM XERADEX lamp