HBO lamps for Microlithography
HBO mercury short arc lamps between 200 and 8,000 watts are used primarily as a light source in the manufacture of microchips, Liquid Crystal Displays (LCD) and Printed Circuit Boards (PCB). These lamps are used in the semiconductor industry because of their strong radiation in the blue, violet and ultraviolet spectral range. OSRAM has been developing, manufacturing and marketing HBO lamps for more than 65 years.
The major technological innovations for OSRAM HBO lamps for microlithography are:
Development of increased wattage lamps
Optimized g-line and I-line emission
Development of pulse-mode lamp
Introduction of longlife and extended longlife lamps
Introduction of new IOFR (Improved Ozone-Free) quartz technology for I-line lamps to further reduce undesirable low UV radiation
Introduction of super high performance lamps (SHP-series)
Our future goal at OSRAM is to focus on innovations in HBO lamp technology. This will include the continued development of higher lamp wattage, increasing service life and optimizing lamp maintenance.
By using materials from our own production facilities, thereby allowing for complete quality control, we are able to achieve extremely high stability in our OSRAM HBO lamps. OSRAM’s use of quartz with the highest optical purity provides for extremely homogeneous and stable radiation properties with excellent lamp maintenance. In addition, we carefully optimized the geometry of the lamp and the electrodes to ensure an efficient conversion of electrical power into radiant power for your applications.
Rapid Thermal Processing (RTP) has become essential to the manufacture of advanced semiconductors, where it is used for oxidation, annealing, silicide formation and deposition. RTP provides fast heating and cooling to process temperatures of approximately 200-1300º C with ramp rates typically 20-250° C per second, within a 1-2 minute timeframe.
RTP systems use a variety of heating configurations, energy sources and temperature control methods. The most widespread approach involves heating the wafer using banks of tungsten halogen lamps either single or double ended.
Benefits of using tungsten halogen lamps:
Convenient and in-expensive
Efficient and longer life cycle
Fast-reacting thermal source that is easily controlled
Wattages from 500 to 3,800
Array of lamps can be placed in a chamber to provide appropriate kilowatt power
Each group of lamps can be cycled from minimum to maximum with great speed and accuracy
Fast, thorough and precise:
The XERADEX systems open new possibilities for innovative dry cleaning processes. At 166 kcal/mol (7.2 eV), the high photon energy of the radiation breaks even tenacious molecular bonds quickly and efficiently.
The concurrent production of ozone and oxygen radicals accelerates cleaning and thus reduces process time considerably. In particular, oxygen radicals O(1D), which are the major contributor to surface cleaning effects, are formed in large quantities by the XERADEX technology.
The UV/ozone cleaning mechanism enables processes like the removal of organics (e.g., photoresist from wafers and photo masks) and the activation of surfaces in semiconductor applications, often minimizing or eliminating the use of harsh chemical treatment steps.
In liquid crystal display and plasma display panel manufacturing, the wettability of the mother glass must be increased for subsequent wet cleaning, coating and etching. Irradiation with XERADEX improves the wettability of glass substrates considerably and 20 times faster than low-pressure mercury lamps.
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